The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 1998
Filed:
Jun. 10, 1996
Applicant:
Inventors:
Takeshi Murakami, Tokyo, JP;
Noriyuki Takeuchi, Hadano, JP;
Hiroyuki Shinozaki, Fujisawa, JP;
Kiwamu Tsukamoto, Fujisawa, JP;
Yukio Fukunaga, Yokohama, JP;
Akihisa Hongo, Yokohama, JP;
Assignee:
Ebara Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
118715 ;
Abstract
A reactant gas ejector head in a thin-film vapor deposition apparatus includes at least two reactant gas inlet passages for introducing reactant gases, a gas mixing chamber for mixing reactant gases introduced from the reactant gas inlet passages, and a nozzle disposed downstream of the gas mixing chamber for rectifying the mixed gases from the gas mixing chamber into a uniform flow and applying the uniform flow to a substrate.
Published as:
EP0747503A1; JPH08337876A; KR970003441A; TW301014B; US5728223A; JP3380091B2; EP0747503B1; DE69630484D1; KR100427426B1; DE69630484T2;