This inventor holds 3 USPTO granted patents. Top assignees: Mitsubishi Chemical Corporation, Sharp Kabushiki Kaisha Corporation, Other. Active years: 2004-2009.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 2,423 
1 out of 25,954 
2 out of 834,513 Years Active: 2004-2009
Title: Noriyuki Saitou: Innovator in Etching Technologies
Introduction
Noriyuki Saitou is a prominent inventor based in Fukuoka, Japan. He has made significant contributions to the field of semiconductor and liquid crystal device manufacturing through his innovative etching technologies. With a total of 3 patents, Saitou's work has advanced the precision and efficiency of etching processes.
Latest Patents
One of Saitou's latest patents involves an etching liquid that contains iodine, an iodine compound, and alcohol as solute, along with solvents such as water. This etching liquid is designed to etch a gold or gold alloy layer on the surface of a substrate for semiconductor or liquid crystal devices evenly. The process results in the formation of a plurality of gold or gold alloy columns, which are etched minimally by the liquid, ensuring that the gold or gold alloy layer between the columns is etched uniformly. Additionally, the etching liquid may include a surfactant to enhance its effectiveness.
Another notable patent focuses on an etching method and etching liquid for silver or silver alloy thin layers. This method allows for uniform etching without producing residues or causing side etching due to over-etching. The etching liquid contains silver ions in a concentration ranging from 0.005 to 1 weight percent. It is introduced into a tank or etching liquid feeding apparatus and then brought into contact with the silver or silver alloy thin layer on the substrate.
Career Highlights
Throughout his career, Noriyuki Saitou has worked with various companies, including Sharp Corporation. His expertise in etching technologies has positioned him as a valuable asset in the field of semiconductor manufacturing.
Collaborations
Saitou has collaborated with notable colleagues such as Makoto Ishikawa and Takuji Yoshida. Their combined efforts have contributed to advancements in etching techniques and materials.
Conclusion
Noriyuki Saitou's innovative work in etching technologies has significantly impacted the semiconductor and liquid crystal device industries. His patents reflect a commitment to enhancing manufacturing processes and improving product quality.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile