Sendai, Japan

Noriyoshi Sato



Average Co-Inventor Count = 4.3

ph-index = 5

Forward Citations = 59(Granted Patents)


Location History:

  • Sendai-shi, Miyagi-ken, JP (2002)
  • Sendai Miyagi-Ken, JP (2004)
  • Aoba-ku, Sendai-shi, Miyagi JP (2009)
  • Sendai, JP (2001 - 2011)

Company Filing History:


Years Active: 2001-2011

Loading Chart...
Loading Chart...
7 patents (USPTO):Explore Patents

Title: Noriyoshi Sato: Innovator in Plasma Technology

Introduction

Noriyoshi Sato is a prominent inventor based in Sendai, Japan. He has made significant contributions to the field of plasma technology, holding a total of 7 patents. His work focuses on methods and devices that enhance the operation of plasma devices, showcasing his innovative spirit and technical expertise.

Latest Patents

Sato's latest patents include a method and device for the operation of a plasma device. This invention describes a process where particles are arranged in a plasma, allowing for the generation of electric traveling waves. These waves facilitate the directed movement of particles to predetermined collection areas. Additionally, he has developed a plasma generator and ozone generator designed for high efficiency and ease of handling. This invention features a simple structure with an electrode part formed of electrodes without dielectric material interposed. An arc-extinguishing capacitor is connected in series to the electrode part, enhancing the functionality of the device.

Career Highlights

Throughout his career, Noriyoshi Sato has worked with notable companies, including Hitachi Kokusai Electric Inc. His experience in these organizations has contributed to his expertise in plasma technology and innovation.

Collaborations

Sato has collaborated with several professionals in his field, including Satoru Iizuka and Yunlong Li. These collaborations have likely enriched his work and led to further advancements in plasma technology.

Conclusion

Noriyoshi Sato is a distinguished inventor whose contributions to plasma technology have made a significant impact. His innovative patents and collaborations reflect his dedication to advancing this field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…