The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 2004
Filed:
Jul. 28, 1998
Other;
Abstract
The object of the present invention is to make possible generation of high-density plasma even in the center of a plasma generation region. A plasma generation apparatus comprises a vacuum vessel , gas induction unit , exhaust unit , cylindrical discharge electrode , high-frequency oscillators and , ring-shaped permanent magnets and , and two disk-shaped walls and . The discharge electrode is fashioned so as to enclose a plasma generation region . The permanent magnets and form prescribed magnetic force lines. These magnetic force lines have portions that are roughly parallel to the center axis of the discharge electrode , the lengths of which parallel portions become longer as the magnetic force lines approach the center axis . The two walls and define the scope of the plasma generation region in the dimension of the center axis of the discharge electrode . These two walls and are positioned so as to sandwich therebetween the plasma generation region in the dimension of the center axis . The plasma generation apparatus is also configured so that the magnetic force lines passing through the center of the plasma generation are shaped so that they do not intersect the two walls and