This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignees: Lintec Corporation, Shin-Etsu Polymer Co., Ltd.. Active years: 2011-2012.
Company Filing History:


Years Active: 2011-2012
Title: Noriyoshi Hosono: Innovator in Semiconductor Technology
Introduction
Noriyoshi Hosono is a prominent inventor based in Saitama, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on improving the efficiency and effectiveness of semiconductor manufacturing processes.
Latest Patents
Hosono's latest patents include innovative designs and methods related to semiconductor wafer processing. One of his notable inventions is a holding jig that enhances the grinding process of semiconductor wafers. This invention features a backgrinding machine that includes a table set on the working plane of a mount, multiple holding jigs arranged via check tables, and a grinding machine for performing the grinding process. Each holding jig is designed with a concave surface and supporting projections, along with a deformable contact film that securely holds the semiconductor wafer in place. Additionally, an exhaust path is incorporated to conduct air from the concave area to the outside, ensuring optimal performance during the grinding process.
Career Highlights
Throughout his career, Noriyoshi Hosono has worked with notable companies such as Shin-Etsu Polymer Co., Ltd. and Lintec Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor technology.
Collaborations
Hosono has collaborated with talented individuals in the field, including Kiyofumi Tanaka and Satoshi Odashima. These partnerships have contributed to the advancement of his inventions and the overall progress in semiconductor manufacturing.
Conclusion
Noriyoshi Hosono's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His innovative approaches continue to shape the future of semiconductor manufacturing processes.