Tachikawa, Japan

Norio Sakamoto

This inventor holds 1 USPTO granted patent. Top assignee: Mcelectronics Co., Ltd.. Active years: 1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Norio Sakamoto. Retrieved from https://idiyas.com/inventor/norio-sakamoto-iu44wnjs

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 1994

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1 patent (USPTO):Explore Patents

Title: Norio Sakamoto: Innovator in Plasma Processing Technology

Introduction

Norio Sakamoto is a notable inventor based in Tachikawa, Japan. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a unique plasma processing chamber that enhances efficiency in various applications.

Latest Patents

Sakamoto holds a patent for a coaxial feeding-type plasma processing chamber. This invention features a cylindrical treatment chamber equipped with both gas-introducing and gas-exhausting mechanisms. The design includes a heating mechanism at the chamber's periphery, an external electrode, and a metal cylindrical member with small apertures. This configuration allows for improved gas flow and processing capabilities.

Career Highlights

Sakamoto is associated with Mcelectronics Co., Ltd., where he has been instrumental in advancing plasma processing technologies. His work has garnered attention for its innovative approach and practical applications in the industry. With a focus on enhancing processing efficiency, Sakamoto continues to push the boundaries of technology.

Collaborations

Sakamoto has collaborated with Shigekazu Takashima, contributing to the development of advanced plasma processing solutions. Their partnership has fostered innovation and has led to significant advancements in their field.

Conclusion

Norio Sakamoto's contributions to plasma processing technology exemplify the spirit of innovation. His patented designs and collaborative efforts continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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