The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 1994
Filed:
Oct. 30, 1992
Shigekazu Takashima, Musashino, JP;
Norio Sakamoto, Tachikawa, JP;
M. C. Electronics Co., Ltd., Tokyo, JP;
Abstract
Disclosed herein is a coaxial feeding-type plasma processing chamber or an opposed electrode-type plasma processing chamber using an Etch-tunnel comprising: a cylindrical treatment chamber having a gas-introducing mechanism and a gas-exhausting mechanism, and equipped with a heating mechanism at the periphery thereof; an external electrode disposed in close contact to the outer periphery of the cylindrical treatment chamber; and a metal cylindrical member disposed coaxially at a predetermined gap to the inner wall of the cylindrical treatment chamber and a having a plurality of small apertures in the side wall thereof, the gas-introducing mechanism being composed of a gas-introducing pipe having a plurality of gas-blowout means and disposed along the longitudinal direction of the cylindrical treatment chamber, and a gas reservoir connected by way of a pipeline; the gas-exhausting mechanism being composed of a gas-exhausting pipe having a plurality of gas-suction apertures and disposed along the longitudinal direction of the cylindrical treatment chamber and a vacuum means connected by way of a pipeline; and at least the gas-exhausting pipe being disposed to the inside of the metal cylindrical member.