This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignees: Sharp Kabushiki Kaisha Corporation, Tadahiro Ohmi, Other. Active years: 2003-2005.
Company Filing History:
1 out of 25,937 
1 out of 27 
1 out of 834,350 Years Active: 2003-2005
Title: Norio Kanetsuki: Innovator in Plasma Processing Technology
Introduction
Norio Kanetsuki is a notable inventor based in Tenri, Japan. He has made significant contributions to the field of plasma processing, holding a total of 2 patents. His innovative approaches have enhanced the efficiency and effectiveness of plasma processing methods and apparatus.
Latest Patents
Kanetsuki's latest patents include a plasma processing method and a plasma process apparatus. The plasma processing method involves generating plasma from a process gas supplied into a process chamber. This method processes a substrate that includes stacked films of at least two types, allowing for a change in the process gas during the plasma generation period. This innovation shortens the time required for processes outside the main plasma operation, thereby improving overall processing speed. The plasma process apparatus is designed to prevent plasma generation in unwanted locations while ensuring uniform and stable plasma processing. It features a processing chamber, a microwave radiating member, and a reactive gas supply member, all working together to optimize plasma processing.
Career Highlights
Throughout his career, Kanetsuki has worked with various companies, including Sharp Corporation. His experience in the industry has allowed him to develop and refine his innovative technologies in plasma processing.
Collaborations
Kanetsuki has collaborated with notable coworkers such as Tatsushi Yamamoto and Masaki Hirayama. Their combined expertise has contributed to advancements in the field of plasma technology.
Conclusion
Norio Kanetsuki's contributions to plasma processing technology demonstrate his commitment to innovation and efficiency. His patents reflect a deep understanding of the complexities involved in plasma processing, making him a significant figure in this field.