Norimichi Tanaka

Title: Norimichi Tanaka: Innovator in Epitaxial Wafer Technology

Introduction

Norimichi Tanaka is a prominent inventor based in Gunma, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the area of epitaxial wafers. With a total of 3 patents to his name, Tanaka's work has had a substantial impact on the industry.

Latest Patents

Tanaka's latest patents include an innovative epitaxial wafer cleaning method. This method involves a series of cleaning steps designed to ensure the purity and quality of wafers with epitaxial films. The process includes a first cleaning step that supplies a cleaning solution containing O to all surfaces of the wafer for spin cleaning. Following this, a second cleaning step utilizes a roll brush for cleaning the back and end surfaces. The third step again employs spin cleaning on the front surface, and the fourth step involves using a cleaning solution containing HF for final spin cleaning. Additionally, he has developed a method for producing epitaxial wafers with buried diffusion layers, showcasing his expertise in advanced semiconductor fabrication techniques.

Career Highlights

Tanaka is currently associated with Shin-Etsu Handotai Co., Ltd., a leading company in the semiconductor industry. His work at the company has been instrumental in advancing wafer technology and improving manufacturing processes.

Collaborations

Throughout his career, Tanaka has collaborated with notable colleagues, including Yutaka Ota and Takashi Itami. These collaborations have further enriched his research and development efforts in the field.

Conclusion

Norimichi Tanaka's contributions to epitaxial wafer technology highlight his role as a key innovator in the semiconductor industry. His patents and ongoing work continue to influence advancements in this critical area of technology.