The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2010
Filed:
Nov. 27, 2006
Applicants:
Norimichi Tanaka, Gunma, JP;
Takashi Itami, Gunma, JP;
Hiroyuki Kobayashi, Gunma, JP;
Inventors:
Assignee:
Shin-Etsu Handotai Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/331 (2006.01);
U.S. Cl.
CPC ...
Abstract
There is disclosed a method for producing an epitaxial wafer with a buried diffusion layer comprising:
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Tanaka, Norimichi. (2010). Method for producing epitaxial wafer with buried diffusion layer and epitaxial wafer with buried diffusion layer (U.S. Patent No. 7799652). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7799652
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile