Company Filing History:
Years Active: 2001-2014
Title: Noriko Hirano: Innovator in Polymer and Silicon Wafer Analysis
Introduction
Noriko Hirano is a distinguished inventor based in Tokyo, Japan. She has made significant contributions to the fields of polymer analysis and silicon wafer technology. With a total of 2 patents, her work has garnered attention for its innovative approaches and practical applications.
Latest Patents
Hirano's latest patents include a "Method of determining minute amounts of additives in polymers." This method allows for the rapid analysis of minute quantities of materials within other substances through a short extraction treatment. The process involves mounting a sample on a table, applying a solvent to extract the minute content, and analyzing the extracted material efficiently.
Another notable patent is the "Apparatus for recovering impurities from a silicon wafer." This invention outlines a two-step method for removing impurities from the surface of silicon wafers. The first step involves using a pretreatment solution to decompose various films on the wafer's surface, while the second step focuses on recovering impurities from the wafer, excluding the peripheral portion.
Career Highlights
Noriko Hirano is currently employed at Mitsubishi Electric Corporation, where she continues to innovate and develop new technologies. Her work has been instrumental in advancing methods for material analysis and semiconductor manufacturing.
Collaborations
Hirano collaborates with esteemed colleagues, including Jiro Naka and Junji Kobayashi. Their combined expertise fosters a dynamic environment for research and development.
Conclusion
Noriko Hirano's contributions to polymer and silicon wafer analysis exemplify her innovative spirit and dedication to advancing technology. Her patents reflect a commitment to improving analytical methods, making her a notable figure in her field.