Mitsubishi Denki Kabushiki Kaisha

Noriko Hirano

Junji Kobayashi

Jiro Naka

Hiroshi Kurokawa

Satoru Toyama

Naohiko Fujino

Eiji Hara

Kazuo Kuramoto

A method for analyzing a minute quantity of a material included in a different material is performed in short extraction treatment without taking a long time and the minute content is rapidly analyzed. The method of analyzing a minute content includes mounting on a sample table a sample piece of a material having a minute content of a different material to be analyzed; dropping onto the sample table a solvent for extracting the minute content from the sample piece, so that the solvent is disposed between the sample table and the sample piece; maintaining at room temperature the solvent between the sample table and the sample piece, and, with the solvent maintained between the sample table and the sample piece, extracting the material of the minute content from the sample piece; and analyzing the content extracted from the sample piece.

Method of determining minute amounts of additives in polymers

A method for recovering impurities on a surface of a silicon wafer includes a first step of using a pretreatment solution to decompose an oxide film, a nitride film on an oxynitridation film formed at a peripheral portion on a surface of a silicon wafer and to remove impurities on the peripheral portion and a second step of recovering impurities on the surface of the wafer expect for the peripheral portion.

Apparatus for recovering impurities from a silicon wafer

Growing community of inventors

Tokyo, Japan

Noriko Hirano