Yonezawa, Japan

Norihito Fukatsu

This inventor holds 5 USPTO granted patents and 1 published patent application. Top assignee: Sumco Corporation. Active years: 2007-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Norihito Fukatsu. Retrieved from https://idiyas.com/inventor/norihito-fukatsu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 5 

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 2

Forward Citations = 6(Granted Patents)


Location History:

  • Tokyo, JP (2007)
  • Yonezawa, JP (2007 - 2010)

Company Filing History:


Years Active: 2007-2025

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5 patents (USPTO):Explore Patents

Title: Norihito Fukatsu: Innovator in Silicon Monocrystal Production

Introduction

Norihito Fukatsu is a prominent inventor based in Yonezawa, Japan. He has made significant contributions to the field of silicon monocrystal production, holding a total of 5 patents. His innovative approaches have advanced manufacturing methods that are crucial for various technological applications.

Latest Patents

Fukatsu's latest patents include a production method for silicon monocrystal. This method involves a melting process that generates a silicon melt containing a primary dopant, followed by a crystal pulling-up process. This process pulls up a silicon single crystal from the silicon melt and includes an additional doping process for adding a secondary dopant. The method also specifies the flow rates of Ar gas during different periods to optimize the doping process. Another notable patent focuses on inhibiting dripped granular dopant from adhering to a growing silicon single crystal. This method utilizes the Czochralski process, where the monocrystalline silicon is pulled while rotating, and the granular dopant is dropped onto the liquid surface of the silicon melt.

Career Highlights

Norihito Fukatsu is currently employed at Sumco Corporation, a leading company in the semiconductor industry. His work has been instrumental in enhancing the efficiency and quality of silicon crystal production. His innovative techniques have positioned him as a key figure in the advancement of semiconductor manufacturing.

Collaborations

Fukatsu has collaborated with notable coworkers, including Kazuyuki Egashira and Senrin Fu. Their combined expertise has contributed to the successful development of advanced manufacturing methods in the field.

Conclusion

Norihito Fukatsu's contributions to silicon monocrystal production exemplify the impact of innovation in technology. His patents and career achievements reflect a commitment to advancing the semiconductor industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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