Norihiro Togawa

Title: Norihiro Togawa: Innovator in Semiconductor Manufacturing

Introduction

Norihiro Togawa is a prominent inventor based in Nagoya, Japan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 2 patents. His work focuses on innovative methods that enhance the efficiency and effectiveness of semiconductor devices.

Latest Patents

Togawa's latest patents include a "Method of Manufacturing Semiconductor Device" and a "Manufacturing Method for Semiconductor Device." The first patent describes a process that involves implanting charged particles, including oxygen, into the surface of a silicon carbide (SiC) wafer. This is followed by the formation of a Schottky electrode that establishes Schottky contact with the SiC wafer after the implantation. The second patent outlines a method that introduces an impurity into a SiC substrate, followed by the formation of a mixed material layer made from resin and fibrous carbon on the surface. This layer undergoes heat treatment, and the mixed material is removed afterward.

Career Highlights

Norihiro Togawa is associated with Toyota Jidosha Kabushiki Kaisha, a leading automotive manufacturer. His role at Toyota has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in semiconductor technology.

Collaborations

Togawa has collaborated with notable colleagues, including Narumasa Soejima and Shoji Mizuno. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies in the semiconductor industry.

Conclusion

Norihiro Togawa's contributions to semiconductor manufacturing exemplify the impact of innovation in technology. His patents reflect a commitment to advancing the field, and his work continues to influence the industry positively.