Utsunomiya, Japan

Norihiro Sakurakawa

This inventor holds 2 USPTO granted patents and 4 published patent applications. Top assignee: Canon Kabushiki Kaisha. Active years: 2020-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Norihiro Sakurakawa. Retrieved from https://idiyas.com/inventor/norihiro-sakurakawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 2.4

ph-index = 1


Company Filing History:


Years Active: 2020-2026

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2 patents (USPTO):Explore Patents

Title: Norihiro Sakurakawa: Innovator in Exposure Technology

Introduction

Norihiro Sakurakawa is a prominent inventor based in Utsunomiya, Japan. He is known for his contributions to exposure technology, particularly in the field of manufacturing processes. His innovative approach has led to significant advancements in the industry.

Latest Patents

Sakurakawa holds a patent for an "Exposure method, exposure apparatus, and method of manufacturing article." This invention provides a method of exposing a substrate via an original held by a stage while scanning the original. The process involves two steps: the first step includes scan-driving the stage with a maximum acceleration that is lower than the second acceleration used in the second step, which occurs while exposing the substrate. He has 1 patent to his name.

Career Highlights

Sakurakawa is associated with Canon Kabushiki Kaisha, a leading company in imaging and printing technologies. His work at Canon has allowed him to develop and refine his innovative ideas, contributing to the company's reputation for excellence in technology.

Collaborations

He has collaborated with notable coworkers such as Hayato Hoshino and Tomonori Awajikawa. Their teamwork has fostered an environment of creativity and innovation, leading to successful projects and advancements in their field.

Conclusion

Norihiro Sakurakawa's contributions to exposure technology exemplify the impact of innovation in manufacturing processes. His work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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