The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 04, 2020

Filed:

May. 23, 2019
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Tomonori Awajikawa, Utsunomiya, JP;

Hayato Hoshino, Utsunomiya, JP;

Norihiro Sakurakawa, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70775 (2013.01); G03F 7/70716 (2013.01); G03F 7/70725 (2013.01); G03F 7/70758 (2013.01);
Abstract

The present invention provides an exposure method of exposing a substrate via an original held by a stage while scanning the original, comprising: performing a first step of scan-driving the stage so that a maximum acceleration becomes a first acceleration; and performing a second step of scan-driving the stage while exposing the substrate so that the maximum acceleration becomes a second acceleration after the performing the first step, wherein the first acceleration is lower than the second acceleration.


Find Patent Forward Citations

Awajikawa, Tomonori. (2020). Exposure method, exposure apparatus, and method of manufacturing article (U.S. Patent No. 10732518). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10732518

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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