This inventor holds 8 USPTO granted patents. Top assignee: Fujitsu Corporation. Active years: 2006-2012.
Company Filing History:
Years Active: 2006-2012
Title: Norihiko Hatano: Innovator in Substrate Manufacturing
Introduction
Norihiko Hatano is a prominent inventor based in Kasugai, Japan. He has made significant contributions to the field of substrate manufacturing, holding a total of eight patents. His innovative work focuses on improving the quality and efficiency of bonded substrates.
Latest Patents
One of his latest patents is an apparatus for manufacturing bonded substrates. This invention aims to suppress defects in the bonded substrate. The apparatus operates by attracting substrates through vacuum when the pressure in a vacuum chamber is at atmospheric level. As the vacuum chamber is depressurized, each chuck unit electrostatically attracts the associated substrate. The pressure for attracting each substrate is controlled to be equal to the pressure in the vacuum chamber, preventing any movement or falling of the substrates. This ensures that the first and second substrates are bonded together with precise alignment.
Career Highlights
Norihiko Hatano has had a successful career at Fujitsu Corporation, where he has been instrumental in developing advanced manufacturing technologies. His expertise in substrate bonding has positioned him as a key figure in the industry.
Collaborations
He has collaborated with notable coworkers, including Koji Hashizume and Yoshimasa Miyajima, contributing to various innovative projects within the company.
Conclusion
Norihiko Hatano's work in substrate manufacturing exemplifies the impact of innovation in technology. His patents reflect a commitment to enhancing manufacturing processes and ensuring high-quality products.