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For the Inventor, By the Inventor

Nirasaki, Japan

Noriaki Shimizu

This inventor holds 5 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2008-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Noriaki Shimizu. Retrieved from https://idiyas.com/inventor/noriaki-shimizu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 5

% Patents Active = 100.0

Average Co-Inventor Count = 1.5

ph-index = 3

Forward Citations = 18(Granted Patents)


Location History:

  • Nirasaki, JP (2008 - 2009)
  • Yamanashi, JP (2008 - 2011)

Company Filing History:

goldMedal5 out of 10,933 
 
Tokyo Electron Limited
 patents

Years Active: 2008-2011

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5 patents (USPTO):Explore Patents
1. 7960187 - Recovery processing method to be adopted in substrate processing apparatus, substrate processing apparatus and program (2011-06-14),
2. 7640072 - Substrate processing apparatus, control method for the apparatus, and program for implementing the method (2009-12-29),
3. 7455747 - Substrate processing apparatus, control method for the apparatus, and program for implementing the method (2008-11-25),
4. 7409253 - System and method for processing a substrate and program therefor (2008-08-05),
5. 7364922 - Automated semiconductor wafer salvage during processing (2008-04-29),

Title: Noriaki Shimizu: Innovator in Substrate Processing Technology

Introduction

Noriaki Shimizu is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of 5 patents. His work focuses on improving the efficiency and reliability of semiconductor manufacturing processes.

Latest Patents

Shimizu's latest patents include a recovery processing method designed to be adopted in substrate processing apparatus. This invention provides a method to restore the substrate processing apparatus to an operational state after an abnormality has occurred. The process involves a substrate retrieval step, where salvage processing is executed for a wafer left in a chamber, followed by retrieving the processed substrate into a cassette storage container. Additionally, he has developed a substrate processing apparatus that allows for improved inspection of various devices within the apparatus, reducing the burden on users while enhancing reliability.

Career Highlights

Noriaki Shimizu is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His innovative work has positioned him as a key figure in advancing substrate processing technologies.

Collaborations

Shimizu has collaborated with notable coworkers, including Masahiro Numakura and Kimihiro Fukasawa. Their combined expertise contributes to the development of cutting-edge technologies in the semiconductor field.

Conclusion

Noriaki Shimizu's contributions to substrate processing technology reflect his dedication to innovation and excellence. His patents and work at Tokyo Electron Limited continue to influence the semiconductor industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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