This inventor holds 3 USPTO granted patents and 3 published patent applications. Top assignees: Tokyo Electron Limited, Kabushiki Kaisha Toshiba. Active years: 2010-2014.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
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Years Active: 2010-2014
Title: Noriaki Imai: Pioneering Innovations in Plasma Processing Technology
Introduction
Noriaki Imai, an accomplished inventor based in Nirasaki, Japan, has made significant contributions to the field of plasma processing technology. With a portfolio of three patents, Imai's work focuses on enhancing the efficiency and effectiveness of plasma processing apparatus and methods utilized in various industrial applications.
Latest Patents
Imai's recent innovations include two notable patents: a plasma processing apparatus and a capacitive coupling plasma processing apparatus. The plasma processing apparatus features a first radio frequency (RF) power supply unit that generates plasma from processing gas, employing a unique control mechanism to alternate between phases of plasma generation and non-generation. This method optimizes the use of RF power for more efficient plasma creation. The capacitive coupling plasma processing apparatus is designed to operate in a vacuum atmosphere, featuring electrodes that form an RF electric field to turn process gas into plasma. This device supports target substrates and incorporates a conductive functional surface to enhance plasma interaction.
Career Highlights
Throughout his career, Noriaki Imai has worked with renowned companies in the semiconductor industry, including Tokyo Electron Limited and Kabushiki Kaisha Toshiba. His expertise in plasma processing has been instrumental in developing cutting-edge technologies that are essential for modern manufacturing processes, particularly in the microelectronics sector.
Collaborations
Imai has collaborated with notable professionals in the field, including Shinji Himori and Tatsuo Matsudo. These collaborations have played a crucial role in advancing his research and innovations, contributing to the overall progress in plasma technology.
Conclusion
Noriaki Imai's contributions to plasma processing technology illustrate his innovative spirit and dedication to advancing the industry. With his patent portfolio and collaborative efforts, Imai continues to influence the evolution of plasma processing, paving the way for future inventions and applications in various sectors.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile