Espoo, Finland

Nora Isomaki


Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: Nora Isomaki: Innovator in Moisture Barrier Technology

Introduction

Nora Isomaki is a prominent inventor based in Espoo, Finland. She has made significant contributions to the field of moisture barrier technology. Her innovative approach has led to the development of a unique moisture barrier device that incorporates advanced materials and fabrication methods.

Latest Patents

Nora Isomaki holds a patent for a multilayer moisture barrier. This invention features a moisture barrier or product that includes at least a polymer layer, an interfacial layer, and a barrier layer. The polymer layer can be made from various suitable polymers, including fluoropolymers such as polyethylene terephthalate (PET) or polyethylene naphthalate (PEN), as well as ethylene-tetrafluoroethylene (ETFE). The interfacial layer may be formed through atomic layer deposition (ALD), utilizing substances like AlO, AlSiO, TiO, and an AlO/TiO laminate. The barrier layer, associated with the interfacial layer, can be deposited using plasma enhanced chemical vapor deposition (PECVD) and may consist of a SiON film. Nora's innovative work in this area has resulted in 1 patent.

Career Highlights

Throughout her career, Nora has worked with notable organizations, including Beneq Oy and the U.S. Department of Energy. Her experience in these institutions has allowed her to refine her skills and contribute to cutting-edge research in moisture barrier technologies.

Collaborations

Nora has collaborated with esteemed colleagues such as Joel W. Pankow and Gary J. Jorgensen. These partnerships have further enhanced her research and development efforts in the field.

Conclusion

Nora Isomaki is a trailblazer in moisture barrier technology, with a focus on innovative materials and methods. Her contributions have the potential to impact various industries, showcasing her dedication to advancing technology.

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