Nobuhiro Konishi

Title: Nobuhiro Konishi: Innovator in Semiconductor Manufacturing

Introduction

Nobuhiro Konishi is a prominent inventor based in Ome, Japan, known for his significant contributions to the field of semiconductor manufacturing. With a total of 5 patents to his name, he has made remarkable advancements in the processes involved in creating integrated circuit devices.

Latest Patents

One of his latest patents focuses on a manufacturing method for semiconductor integrated circuit devices. This method involves a Cu-CMP step applied to processes for 130 nm, 90 nm, and 65 nm technical nodes. The innovation primarily employs slurry with an added anticorrosive agent to prevent corrosion of Cu wiring. Konishi and his team discovered that the anticorrosive agent can form complexes with Cu, which can lead to a reduction in yield and reliability of TDDB characteristics of the Cu wiring. To address this issue, the invention includes a post-CMP cleaning process that applies wet cleaning to a wafer by supplying a cleaning solution in a vertical direction while rotating the wafer to ensure uniform thickness of the cleaning solution across the device surface.

Another notable patent involves a manufacturing method that includes chemically and mechanically polishing two conductive layers using polishing pads with different properties. This method ensures that buried wirings formed in wiring trenches have a uniform height, regardless of the width and density of the trenches. The polishing agent used in this process controls the removal rate of the underlying insulator relative to the barrier conductor film, ensuring precision in the CMP process.

Career Highlights

Throughout his career, Nobuhiro Konishi has worked with leading companies in the semiconductor industry, including Renesas Technology Corporation and Hitachi, Ltd. His expertise and innovative approaches have significantly impacted the development of semiconductor technologies.

Collaborations

Konishi has collaborated with notable colleagues in his field, including Junji Noguchi and Shoji Asaka. Their combined efforts have contributed to the advancement of semiconductor manufacturing techniques.

Conclusion

Nobuhiro Konishi's work in semiconductor manufacturing showcases his dedication to innovation and excellence. His patents reflect a deep understanding of the complexities involved in the production of integrated circuit devices. His contributions continue to influence the industry and pave the way for future advancements.