Nobuhiko Mutoh

Title: Nobuhiko Mutoh: Innovator in Solid State Imaging Technology

Introduction

Nobuhiko Mutoh is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of solid state imaging devices, holding a total of 11 patents. His work has advanced the technology used in various imaging applications, showcasing his expertise and innovative spirit.

Latest Patents

Among his latest patents is a solid state imaging device and method for manufacturing the same. This invention features a charge storing layer of a photodiode with N-type conductivity, which includes an N-type additional implant area near the junction between the charge storing layer and an isolation region. This additional implant area enhances the stored charge and suppresses the increase of pulse voltage for a substrate shutter, while also allowing for a smaller width within current design rules. Another notable patent is for a charge transfer device, along with its driving and manufacturing methods. In this device, electrons are injected through an insulating film into a floating gate, or extracted from it, thereby stabilizing the potential of the floating gate to a fixed voltage.

Career Highlights

Nobuhiko Mutoh is currently associated with NEC Corporation, a leading technology company known for its innovations in various fields. His work at NEC has allowed him to push the boundaries of imaging technology, contributing to advancements that benefit both consumers and industries alike.

Collaborations

Throughout his career, Mutoh has collaborated with notable colleagues, including Takashi Nakano and Nobukazu Teranishi. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Nobuhiko Mutoh's contributions to solid state imaging technology exemplify his innovative mindset and dedication to advancing the field. His patents reflect a commitment to improving imaging devices, making a lasting impact on the industry.