Tokyo, Japan

Nobuhide Nunomura

This inventor holds 4 USPTO granted patents. Top assignees: Hitachi-High-Technologies Corporation, Hitachi High-Tech Corporation. Active years: 2014-2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobuhide Nunomura. Retrieved from https://idiyas.com/inventor/nobuhide-nunomura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 75.0

Average Co-Inventor Count = 3.3

ph-index = 3

Forward Citations = 39(Granted Patents)


Location History:

  • Hikari, JP (2014)
  • Tokyo, JP (2018 - 2021)

Company Filing History:


Years Active: 2014-2021

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4 patents (USPTO):Explore Patents

Title: Nobuhide Nunomura: Innovator in Plasma Processing Technology

Introduction

Nobuhide Nunomura is a distinguished inventor based in Tokyo, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of four patents. His work has been instrumental in advancing semiconductor manufacturing processes.

Latest Patents

Among his latest patents are a discharge chamber for a plasma processing apparatus and an infrared lamp heater transmission window for semiconductor manufacturing apparatus. These innovations reflect his commitment to enhancing efficiency and effectiveness in semiconductor production.

Career Highlights

Nobuhide Nunomura has had a notable career, working with prominent companies such as Hitachi High-Technologies Corporation and Hitachi High-Tech Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas in the field of technology.

Collaborations

Nobuhide has collaborated with talented individuals, including Michiaki Kobayashi and Kazuyuki Hirozane. These partnerships have contributed to the successful development of his patented technologies.

Conclusion

Nobuhide Nunomura's contributions to plasma processing technology and his collaborations with esteemed colleagues highlight his role as a key innovator in the semiconductor industry. His work continues to influence advancements in manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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