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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8707899 B1

PDFFull Text
Expired
Date of Patent:
Apr. 29, 2014

Filed:

Feb. 26, 2009

Plasma processing apparatus

Applicants:

Ryouta Kitani, Hikari, JP;

Nobuhide Nunomura, Hikari, JP;

Yasukiyo Morioka, Kudamatsu, JP;

Motohiko Yoshigai, Hikari, JP;

Inventors:

Ryouta Kitani, Hikari, JP;

Nobuhide Nunomura, Hikari, JP;

Yasukiyo Morioka, Kudamatsu, JP;

Motohiko Yoshigai, Hikari, JP;

Assignee:

Hitachi High-Technologies Corporation, Tokyo, JP;

Attorney:

Antonelli, Terry, Stout & Kraus, LLP.

Primary Examiner:

Rudy Zervigon

Int. Cl.
CPC ...
C23C 16/50 (2006.01); C23C 16/503 (2006.01); C23C 16/505 (2006.01); C23C 16/509 (2006.01); C23C 16/455 (2006.01); H01L 21/306 (2006.01); C23F 1/00 (2006.01); C23C 16/06 (2006.01); C23C 16/22 (2006.01);
U.S. Cl.
CPC ...
Abstract

A plasma processing apparatus for processing a subject placed on a subject stage disposed in a processing chamber in a vacuum vessel, by using plasma formed in said processing chamber, includes: an exhaust space communicating with the processing chamber, extending in a horizontal direction, and exhausting gas in the processing chamber; an exhaust port communicating with the exhaust space, the gas being exhausted via the exhaust port; a pump disposed communicating with the exhaust port and exhausting the gas; and a plate member disposed in the exhaust space between a connection portion to the processing chamber and the exhaust port, extending along a direction connecting the connection portion and the exhaust port, and disposed outside a view angle from an upper surface of the subject stage.

Find Patent Forward Citations

Kitani, Ryouta. (2014). Plasma processing apparatus (U.S. Patent No. 8707899). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8707899

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