This inventor holds 5 USPTO granted patents and 1 published patent application and 1 EPO patent. Top assignees: Nidec Corporation, Flosfia Inc., Kyoto Electronics Manufacturing Company, Limited. Active years: 2006-2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:


Years Active: 2006-2025
Title: Innovations of Nobuaki Watanabe
Introduction
Nobuaki Watanabe is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of technology, particularly in the development of devices and methods that enhance measurement and material formation. With a total of 5 patents to his name, Watanabe continues to push the boundaries of innovation.
Latest Patents
Watanabe's latest patents include a residual gas volume measuring device and a method of forming a film. The residual gas volume measuring device is designed to accurately measure the volume of residual gas while preventing deterioration in a pump that pressurizes an airtight container. This device features a second pipe through which an airtight container filled with a basic carbon dioxide absorbing liquid and a second reservoir retaining pressurization water are in communication. The method of forming a film involves turning a raw material containing at least a first and a second chemical element into atomized droplets, which are then carried by a carrier gas onto an object to form a film.
Career Highlights
Throughout his career, Watanabe has worked with notable companies such as Nidec Corporation and Flosfia Inc. His experience in these organizations has allowed him to refine his skills and contribute to various innovative projects.
Collaborations
Watanabe has collaborated with esteemed colleagues, including Tokichi Ito and Yoshito Oku. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.
Conclusion
Nobuaki Watanabe's work exemplifies the spirit of innovation and dedication to advancing technology. His patents and collaborations reflect his commitment to improving measurement techniques and material formation processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile