Wako, Japan

Nobuaki Miyakawa

This inventor holds 32 USPTO granted patents and 1 EPO patent, primarily in Semiconductor Devices. Top assignees: Hitachi, Ltd., Honda Motor Co., Ltd., Hitachi Haramachi Semi-Conductor, Ltd.. Active years: 1977-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nobuaki Miyakawa. Retrieved from https://idiyas.com/inventor/nobuaki-miyakawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 62.5


Average Co-Inventor Count = 2.6

ph-index = 10

Forward Citations = 356(Granted Patents)


Location History:

  • Hitachi, JA (1977 - 1978)
  • Hitachi, JP (1979 - 1985)
  • Ibaraki, JP (1978 - 1991)
  • Nakai-machi, JP (2003 - 2008)
  • Saitama, JP (2010)
  • Niiza, JP (2011)
  • Wako, JP (2009 - 2013)

Company Filing History:


Years Active: 1977-2013

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Areas of Expertise:
Semiconductor Device
Manufacturing Method
Neural Network Element
Memory Device
Parallel Processing
Analog-Digital Converter
Photodetector Device
Engine Control
Display Device
Circuit Design
Data Acquisition
Fuel Injection
32 patents (USPTO):Explore Patents

Title: Nobuaki Miyakawa: Innovator in Semiconductor Technology

Introduction

Nobuaki Miyakawa, based in Wako, Japan, is an esteemed inventor with an impressive portfolio of 32 patents, primarily focusing on semiconductor devices. His work in the field reflects a commitment to pushing the boundaries of technology, particularly in semiconductor manufacturing.

Latest Patents

Miyakawa's most recent innovations include a pioneering manufacturing method for semiconductor devices. His patent details a method of achieving a desired integrated circuit by adhering multiple semiconductor substrates together while electrically connecting integrated circuits formed on individual semiconductor chips. This method features a penetrating electrode that passes through each substrate and a separation portion designed to enhance the structure. Additionally, his innovative technique for creating a semiconductor device involves forming a deep isolation trench embedded with an insulating film. A MOSFET is subsequently developed on the substrate's main surface, culminating in a sophisticated three-dimensional configuration that improves the element characteristics of semiconductor devices.

Career Highlights

Miyakawa has built a robust career with significant contributions during his tenure at prominent companies such as Hitachi, Ltd. and Honda Motor Co., Ltd. His experience in these organizations has not only enriched his understanding of semiconductor technologies but has also played a vital role in advancing industry standards.

Collaborations

Throughout his career, Miyakawa has collaborated with esteemed colleagues, including Takanori Maebashi and Masayuki Miki. These partnerships showcase his ability to work effectively within teams, contributing to innovative solutions in semiconductor production.

Conclusion

Nobuaki Miyakawa stands out as a leading innovator in the semiconductor industry. His extensive patent portfolio and collaborative efforts highlight his significant contributions to technology. As advancements in semiconductor devices continue to evolve, Miyakawa's work will undoubtedly influence future developments in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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