Noboru Otsuka

Title: Noboru Otsuka: Innovator in Radiation-Sensitive Resin Technology

Introduction

Noboru Otsuka is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of radiation-sensitive resin compositions. With a total of 4 patents to his name, Otsuka's work has advanced the technology used in various applications.

Latest Patents

Otsuka's latest patents include innovative formulations for radiation-sensitive resin compositions. One patent describes a composition that includes a polymer and a photoacid generator. This polymer consists of multiple structural units, with a notable emphasis on a first structural unit that constitutes 50 mol % or more of the total structural units. Another patent focuses on a resin that becomes alkali-soluble through the action of an acid, incorporating an acid labile group-containing resin, a radiation-sensitive acid generator, and a solvent.

Career Highlights

Noboru Otsuka is currently associated with JSR Corporation, where he continues to develop cutting-edge materials. His expertise in radiation-sensitive resins has positioned him as a key figure in the industry. His work not only enhances the performance of existing technologies but also paves the way for new innovations.

Collaborations

Otsuka has collaborated with notable colleagues, including Yukio Nishimura and Akimasa Soyano. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of new technologies.

Conclusion

Noboru Otsuka's contributions to radiation-sensitive resin technology exemplify the impact of innovative thinking in the field of materials science. His patents reflect a commitment to advancing technology and improving applications across various industries.