Koshi, Japan

Noboru Nakashima


Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2017-2019

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2 patents (USPTO):Explore Patents

Title: Noboru Nakashima: Innovator in Substrate Processing Technologies

Introduction

Noboru Nakashima is a prominent inventor based in Koshi, Japan. He has made significant contributions to the field of substrate processing, particularly through his innovative patents. With a total of 2 patents, Nakashima has developed technologies that enhance the efficiency and effectiveness of substrate cleaning and polishing processes.

Latest Patents

Nakashima's latest patents include a polishing cleaning mechanism, substrate processing apparatus, and substrate processing method. These inventions are designed to be in contact with the rear surface of a substrate held in a substrate holding unit. The mechanism performs both polishing and cleaning processes on the substrate's rear surface. It features a cleaning member that effectively cleans the substrate, a polishing member that polishes the substrate, and a support member that positions both the polishing and cleaning members to face the substrate. Notably, the surfaces of the polishing and cleaning members differ in relative height, optimizing their functionality.

Career Highlights

Noboru Nakashima is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at this organization has allowed him to focus on advancing substrate processing technologies, contributing to the company's reputation for innovation.

Collaborations

Nakashima has collaborated with notable coworkers, including Akihiro Kubo and Masahiro Fukuda. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies in substrate processing.

Conclusion

Noboru Nakashima's contributions to substrate processing through his innovative patents highlight his role as a key inventor in this field. His work continues to influence the efficiency of substrate cleaning and polishing processes, showcasing the importance of innovation in technology.

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