Nobihiro Tokoro

Title: The Innovative Mind of Nobihiro Tokoro

Introduction

Nobihiro Tokoro is an accomplished inventor based in West Newbury, Massachusetts. With a focus on advancements in ion implantation techniques, Tokoro has made significant contributions to the field of semiconductor equipment.

Latest Patents

Tokoro holds a patent for a "Method, system, and apparatus for improving doping uniformity in high-tilt ion implantation." This innovative invention addresses the challenges of achieving consistent doping uniformity during ion implantation, particularly under high-tilt conditions. The method involves several key steps, including positioning a wafer at a specific angle to an ion beam, measuring the ion beam's current with a moving detector, and adjusting the doping uniformity based on the measurements obtained.

Career Highlights

Currently, Tokoro is affiliated with Varian Semiconductor Equipment Associates, Inc., where he applies his expertise in enhancing semiconductor processing techniques. His work at Varian has positioned him as a valuable asset in the technology sector, navigating the complexities of modern ion implantation methods.

Collaborations

Throughout his career, Tokoro has collaborated with other talented professionals, including Shengwu Chang and Isao Tsunoda. These partnerships have further enriched his work and contributed to the development of innovative solutions in the semiconductor industry.

Conclusion

Nobihiro Tokoro's contributions to the field of ion implantation and semiconductor technology showcase his inventive spirit and dedication to advancing industry standards. As he continues to innovate, his work will undoubtedly impact the future of semiconductor manufacturing.