This inventor holds 1 USPTO granted patent. Top assignee: Asml Netherlands B.v.. Active years: 2025.
Company Filing History:
Years Active: 2025
Title: Nikolaos Sotiropoulos: Innovator in Lithographic Technology
Introduction
Nikolaos Sotiropoulos is a prominent inventor based in Eindhoven, Netherlands. He is known for his contributions to lithographic technology, particularly in enhancing illumination uniformity in lithographic apparatuses. With a focus on innovation, Sotiropoulos has made significant strides in the field, holding a patent that showcases his expertise.
Latest Patents
Sotiropoulos holds a patent for a "Lithographic apparatus and method for illumination uniformity correction." This invention involves a lithographic apparatus that comprises an illumination system designed to condition a radiation beam. Additionally, it features a uniformity correction system that adjusts the intensity profile of the radiation beam. The apparatus is equipped with a control system that manages the uniformity correction system based on a thermal status criterion, which indicates the thermal state of a part of the lithographic apparatus.
Career Highlights
Nikolaos Sotiropoulos is currently employed at ASML Netherlands B.V., a leading company in the field of lithography. His work at ASML has allowed him to contribute to cutting-edge technologies that are essential for semiconductor manufacturing. His innovative approach and technical skills have positioned him as a valuable asset in the industry.
Collaborations
Sotiropoulos has collaborated with notable colleagues, including Albertus Hartgers and Michael Frederik Ypma. These collaborations have fostered a creative environment that encourages the development of advanced lithographic solutions.
Conclusion
In summary, Nikolaos Sotiropoulos is a key figure in the field of lithographic technology, with a focus on improving illumination uniformity. His patent and work at ASML highlight his commitment to innovation and excellence in the industry.