The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2025
Filed:
Feb. 24, 2022
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Nikolaos Sotiropoulos, Eindhoven, NL;
Albertus Hartgers, Berkel-Enschot, NL;
Michael Frederik Ypma, Zaltbommel, NL;
Marco Matheus Louis Steeghs, Sevenum, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70141 (2013.01); G03F 7/70066 (2013.01); G03F 7/70525 (2013.01); G03F 7/7085 (2013.01); G03F 7/70891 (2013.01);
Abstract
A lithographic apparatus comprising an illumination system configured to condition a radiation beam and a uniformity correction system configured to adjust an intensity profile of the radiation beam. The lithographic apparatus comprises a control system configured to control the uniformity correction system at least partially based on a thermal status criterion that is indicative of a thermal state of a part of the lithographic apparatus.