Berkel-Enschot, Netherlands

Albertus Hartgers

USPTO Granted Patents = 1 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Albertus Hartgers: Innovator in Lithographic Technology

Introduction

Albertus Hartgers is a notable inventor based in Berkel-Enschot, Netherlands. He has made significant contributions to the field of lithography, particularly in the area of illumination uniformity correction. His innovative work has implications for various applications in the semiconductor industry.

Latest Patents

Hartgers holds a patent for a lithographic apparatus and method for illumination uniformity correction. This invention involves a lithographic apparatus that comprises an illumination system designed to condition a radiation beam. Additionally, it features a uniformity correction system that adjusts the intensity profile of the radiation beam. The apparatus is equipped with a control system that manages the uniformity correction system based on a thermal status criterion, which indicates the thermal state of a part of the lithographic apparatus. This patent showcases Hartgers' commitment to enhancing the efficiency and effectiveness of lithographic processes.

Career Highlights

Albertus Hartgers is currently employed at ASML Netherlands B.V., a leading company in the development of advanced lithography systems. His role at ASML allows him to work at the forefront of technology, contributing to innovations that drive the semiconductor industry forward. His expertise in lithographic technology has positioned him as a valuable asset within the company.

Collaborations

Throughout his career, Hartgers has collaborated with talented individuals such as Nikolaos Sotiropoulos and Michael Frederik Ypma. These collaborations have fostered an environment of innovation and creativity, leading to advancements in lithographic technology.

Conclusion

Albertus Hartgers is a distinguished inventor whose work in lithographic technology has made a significant impact on the industry. His patent for illumination uniformity correction exemplifies his innovative spirit and dedication to improving lithographic processes. Hartgers continues to contribute to the field through his role at ASML Netherlands B.V., where he collaborates with other experts to push the boundaries of technology.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…