Medford, NY, United States of America

Nikhil Tiwale

This inventor holds 2 USPTO granted patents. Top assignees: Brookhaven Science Associates, Lcc, The State University of New York, The University of Texas System. Active years: 2024-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nikhil Tiwale. Retrieved from https://idiyas.com/inventor/nikhil-tiwale-22xy4cqf

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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% Patents Active = 100.0

Average Co-Inventor Count = 5.1

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Company Filing History:


Years Active: 2024-2025

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2 patents (USPTO):Explore Patents

Title: Nikhil Tiwale: Innovator in Memory Device Technology

Introduction

Nikhil Tiwale is a prominent inventor based in Medford, NY (US). He has made significant contributions to the field of memory device technology, holding 2 patents that showcase his innovative approach to resistive random-access memory devices.

Latest Patents

One of his latest patents is titled "Metal-oxide infiltrated organic-inorganic hybrid resistive random-access memory device." This invention describes a resistive random access memory (RRAM) device that includes multiple memory cells. Each memory cell consists of first and second electrodes, along with an organic thin film compound mixed with silver perchlorate (AgClO) salt as a base layer. This base layer is incorporated with a specific quantity of inorganic metal oxide molecules using vapor-phase infiltration (VPI). The resistive switching characteristics of the RRAM device are controlled based on the concentration of AgClO salt in the base layer. Additionally, the variation of device switching parameters is influenced by the amount of infiltrated metal oxide molecules in the base layer.

Another notable patent is "Inorganic-infiltrated polymer hybrid thin film resists for advanced lithography." This invention provides a method that utilizes existing infrastructure, such as atomic layer deposition or similar vapor-based deposition tools, to infiltrate certain metals or metal-based precursors into resist materials. This process enhances the performance of the resists for advancing lithography techniques.

Career Highlights

Nikhil Tiwale has worked with reputable organizations, including Brookhaven Science Associates and the State University of New York. His experience in these institutions has allowed him to develop and refine his innovative ideas in memory technology.

Collaborations

Throughout his career, Nikhil has collaborated with notable colleagues, including Chang-Yong Nam and Ashwanth Subramanian. These collaborations have contributed to the advancement of his research and inventions.

Conclusion

Nikhil Tiwale is a distinguished inventor whose work in memory device technology has led to significant advancements in the field. His innovative patents reflect his commitment to enhancing memory device performance and lithography techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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