The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2024
Filed:
Mar. 04, 2020
Brookhaven Science Associates, Llc, Upton, NY (US);
The Board of Regents, the University of Texas System, Austin, TX (US);
The Research Foundation for the State University of New York, Albany, NY (US);
Chang-Yong Nam, Stony Brook, NY (US);
Aaron Stein, Huntington Station, NY (US);
Ming Lu, Stony Brook, NY (US);
Jiyoung Kim, Plano, TX (US);
Nikhil Tiwale, Medford, NY (US);
Su Min Hwang, Plano, TX (US);
Ashwanth Subramanian, Stony Brook, NY (US);
Brookhaven Science Associates, LLC, Upton, NY (US);
Board of Regents, The University of Texas System, Austin, TX (US);
The Research Foundation for The State University of New York, Albany, NY (US);
Abstract
The present invention provides a method that utilizes an existing infrastructure such as atomic layer deposition or similar vapor-based deposition tool or metal salt solutions based infiltration to infiltrate certain metals or metal-based precursors into resist materials to enhance the performance of the resists for the advancement of lithography techniques.