Su Min Hwang

Title: Su Min Hwang: Innovator in Advanced Lithography Techniques

Introduction

Su Min Hwang is a notable inventor based in Plano, TX (US). She has made significant contributions to the field of lithography through her innovative patent. Her work focuses on enhancing the performance of resist materials, which are crucial for advanced lithography techniques.

Latest Patents

Su Min Hwang holds a patent titled "Inorganic-infiltrated polymer hybrid thin film resists for advanced lithography." This invention provides a method that utilizes existing infrastructure, such as atomic layer deposition or similar vapor-based deposition tools, to infiltrate certain metals or metal-based precursors into resist materials. This process enhances the performance of the resists, thereby advancing lithography techniques.

Career Highlights

Throughout her career, Su Min Hwang has worked with reputable organizations, including Brookhaven Science Associates, LLC and the University of Texas System. Her experience in these institutions has allowed her to develop her expertise in the field of lithography and materials science.

Collaborations

Su Min Hwang has collaborated with notable colleagues, including Chang-Yong Nam and Aaron Stein. These collaborations have contributed to her innovative work and advancements in lithography.

Conclusion

Su Min Hwang is a pioneering inventor whose work in advanced lithography techniques has the potential to significantly impact the field. Her innovative patent and collaborations highlight her contributions to materials science and technology.