Company Filing History:
Years Active: 2009
Title: The Innovative Contributions of Nigel Hackera
Introduction
Nigel Hackera is a notable inventor based in Espoo, Finland. He has made significant contributions to the field of dielectric materials, particularly through his innovative patent. His work is characterized by a focus on enhancing the properties of materials used in various applications.
Latest Patents
Nigel Hackera holds a patent for a method of forming a low dielectric constant structure. This method involves providing a dielectric material at a first temperature, which has a specific dielectric constant and elastic modulus. The curing process is achieved through thermal curing, where the material is heated to a second temperature at an average rate of at least 1°C per second. The result is a densified dielectric material with a low dielectric constant, which has potential applications in electronics and other fields.
Career Highlights
Nigel is currently employed at Silecs Oy, a company known for its advancements in silicon-based materials. His work at Silecs Oy has allowed him to explore innovative solutions in the field of dielectric materials. His expertise and dedication have contributed to the company's reputation for excellence in material science.
Collaborations
Throughout his career, Nigel has collaborated with talented individuals such as Jason S Reid and Nina Pirilä. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.
Conclusion
Nigel Hackera's contributions to the field of dielectric materials through his patent and work at Silecs Oy highlight his role as an influential inventor. His innovative methods and collaborative spirit continue to drive advancements in material science.