This inventor holds 6 USPTO granted patents. Top assignees: U.S. Philips Corporation, Asm Lithography B.v.. Active years: 1990-1996.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1990-1996
Title: Nicolaas C Van Hijningen: Innovator in Illumination Technology
Introduction
Nicolaas C Van Hijningen is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of illumination technology, holding a total of 6 patents. His work focuses on enhancing the efficiency and functionality of imaging apparatuses and illumination units.
Latest Patents
One of his latest patents involves an illumination unit designed to prevent contamination. This invention includes an illumination housing that accommodates a radiation source and at least one reflector. The housing is equipped with mechanisms to prevent the formation of silicon-containing particles on optical components, thereby maintaining the radiation power supplied by the unit. Another recent patent describes an arrangement for measuring the reflection and/or transmission of an object. This arrangement consists of a frame, a carrier for the object, a radiation source, and a detector unit that can pivot and move rectilinearly, allowing for precise measurements.
Career Highlights
Throughout his career, Nicolaas has worked with prominent companies such as U.S. Philips Corporation and ASML Lithography B.V. His experience in these organizations has contributed to his expertise in the field of illumination and imaging technologies.
Collaborations
Nicolaas has collaborated with notable individuals in his field, including Johannes H Pasman and Cornelis J Van Nimwegen. These collaborations have likely enriched his work and led to innovative advancements in his projects.
Conclusion
Nicolaas C Van Hijningen is a distinguished inventor whose work in illumination technology has led to several important patents. His contributions continue to influence the field and enhance imaging technologies.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

