This inventor holds 4 USPTO granted patents and 1 published patent application. Top assignees: Globalfoundries Inc., International Business Machines Corporation. Active years: 2015-2017.
Company Filing History:
3 out of 5,671 
1 out of 166,264 
Years Active: 2015-2017
Title: The Innovations of Nicholas G Clore
Introduction
Nicholas G Clore is an accomplished inventor based in Essex Junction, VT (US). He holds a total of 4 patents that showcase his expertise in semiconductor technology and microelectronics. His innovative contributions have significantly impacted the field, particularly in the areas of thermal profiling and microelectronic device fabrication.
Latest Patents
One of Clore's latest patents is focused on "Determining thermal profiles of semiconductor structures." This invention involves forming a semiconductor substrate on a surface and determining luminescent intensity values to establish a thermal profile. This profile provides critical information about the semiconductor substrate after exposure to specific conditions. Another notable patent is for "Fabricating a microelectronics lid using sol-gel processing." This method describes the creation of a lid for a microelectronic device by forming a gel with a coefficient of thermal expansion that aligns with the device's components.
Career Highlights
Throughout his career, Clore has worked with prominent companies such as Globalfoundries Inc. and International Business Machines Corporation (IBM). His experience in these leading organizations has allowed him to refine his skills and contribute to groundbreaking advancements in technology.
Collaborations
Clore has collaborated with notable professionals in his field, including Stephen Peter Ayotte and Andrew H Norfleet. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
Nicholas G Clore's contributions to the field of semiconductor technology and microelectronics are noteworthy. His patents reflect a commitment to innovation and a deep understanding of complex engineering challenges. His work continues to influence the industry and inspire future advancements.