The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 02, 2017

Filed:

Jun. 12, 2014
Applicant:

Globalfoundries Inc., Grand Cayman, KY;

Inventors:

Nicholas G. Clore, Essex Junction, VT (US);

Kendra A. Lyons, Westminster, CO (US);

Andrew H. Norfleet, Essex Junction, VT (US);

Jared P. Yanofsky, Somerville, MA (US);

Assignee:

GLOBALFOUNDRIES Inc., Grand Cayman, KY;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 31/26 (2014.01); H01L 21/66 (2006.01); G01J 5/08 (2006.01); G01J 5/02 (2006.01); G01J 5/00 (2006.01); G01J 5/28 (2006.01);
U.S. Cl.
CPC ...
G01J 5/0878 (2013.01); G01J 5/0007 (2013.01); G01J 5/025 (2013.01); G01J 2005/0085 (2013.01); G01J 2005/283 (2013.01); H01L 22/12 (2013.01); H01L 22/20 (2013.01); H01L 22/34 (2013.01);
Abstract

According to embodiments of the present invention, a semiconductor substrate is formed on at least a portion of a surface of a semiconductor substrate. The emitting layer is excited for a first predetermined time period. A first luminescent intensity value of the emitting layer is determined. In response to exposing the semiconductor substrate and the emitting layer to a condition for a second predetermined time period, a second luminescent intensity value of the emitting layer is determined. A thermal profile of at least the portion of the surface of the semiconductor substrate is determined utilizing the first luminescent intensity value and the second luminescent intensity value of the emitting layer. The thermal profile at least reflects information about one or more of the condition and the semiconductor substrate subsequent to exposure to the condition.


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