Garrett Park, MD, United States of America

Nicholas Doudoumopoulos

This inventor holds 2 USPTO granted patents. Top assignee: Potomac Photonics, Inc.. Active years: 2010-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nicholas Doudoumopoulos. Retrieved from https://idiyas.com/inventor/nicholas-doudoumopoulos

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2010-2011

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2 patents (USPTO):Explore Patents

Title: The Innovations of Nicholas Doudoumopoulos

Introduction

Nicholas Doudoumopoulos is a notable inventor based in Garrett Park, MD (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of laser-assisted manufacturing processes. With a total of 2 patents, his work focuses on improving efficiency and reducing costs in the production of polycrystalline silicon.

Latest Patents

Doudoumopoulos's latest patents include a "Method and system for spatially selective crystallization of amorphous silicon." This innovative manufacturing methodology utilizes a spatially selective crystallization approach to produce polycrystalline silicon in a time and cost-efficient manner. The process involves subjecting an amorphous silicon film to laser radiation at localized areas where thin-film transistors (TFTs) are to be formed. The use of a copper vapor laser allows for highly stable radiation in the visible spectrum, effectively converting amorphous silicon into polysilicon in just 1-3 shots. The optic system is designed to deliver a homogenized, conditioned, and focused laser beam to the area of interest in a controlled manner.

Another significant patent is the "Method of spatially selective laser-assisted doping of a semiconductor." This method employs spatially selective laser doping to irradiate predetermined portions of a semiconductor substrate. Dopants are deposited onto the substrate's surface, and a pulsed, visible beam is directed to regions requiring doping. The method enhances efficiency by providing uniform irradiation with fewer laser shots, ultimately achieving savings in cost and manufacturing throughput, especially in doping polycrystalline silicon.

Career Highlights

Doudoumopoulos works at Potomac Photonics, Inc., where he continues to develop innovative solutions in semiconductor manufacturing. His expertise in laser technology and semiconductor processes has positioned him as a key figure in advancing the industry.

Collaborations

Some of his notable coworkers include Paul Wickboldt and C Paul Christensen, who contribute to the collaborative environment at Potomac Photonics, Inc.

Conclusion

Nicholas Doudoumopoulos's contributions to semiconductor technology through his innovative patents demonstrate his commitment to enhancing manufacturing processes. His work not only improves efficiency but also paves the way for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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