North Hills, NY, United States of America

Nicholas C Fuller

USPTO Granted Patents = 26 

Average Co-Inventor Count = 4.1

ph-index = 6

Forward Citations = 187(Granted Patents)


Location History:

  • Elmsford, NY (US) (2007 - 2011)
  • Ossining, NY (US) (2008 - 2012)
  • Armonk, NY (US) (2019)
  • North Hills, NY (US) (2011 - 2020)

Company Filing History:


Years Active: 2007-2020

where 'Filed Patents' based on already Granted Patents

26 patents (USPTO):

Title: **Innovations and Contributions of Nicholas C. Fuller**

Introduction

Nicholas C. Fuller, based in North Hills, NY, has established himself as a prolific inventor in the field of microelectronics. With a total of 26 patents to his name, Fuller has made significant contributions to advancing technology and innovation, particularly in interconnect structures and materials used in microcircuits.

Latest Patents

Fuller's latest patents showcase his expertise in enhancing electrical connections within microelectronic devices. One of his innovative patents is titled **"Interconnect structures with fully aligned vias."** This invention involves a structure featuring fully aligned vias that connect metal lines across various metal levels, enhancing connectivity and reducing signal loss.

Another noteworthy patent from Fuller is **"Enhanced via fill material and processing for dual damascene integration."** This process focuses on insulating porous low-k substrates with an organic polymer coating that minimizes capacitance increases, crucial for maintaining the efficiency of microcircuits. These patents reflect Fuller's commitment to pushing the boundaries of current technology and improving microelectronic design.

Career Highlights

Nicholas C. Fuller has spent a significant portion of his career at the **International Business Machines Corporation (IBM)**, where he has played a vital role in research and development. Through his innovative work, he has contributed to the advancement of microelectronics, demonstrating his keen understanding of complex materials and structures.

Collaborations

Fuller’s success can also be attributed to his collaborations with talented colleagues such as **Timothy Joseph Dalton** and **Liangzhao Zeng**. These partnerships have fostered an environment of innovation, allowing them to tackle complex engineering challenges and produce cutting-edge solutions in the field.

Conclusion

Nicholas C. Fuller's work embodies the spirit of innovation that drives the technology sector forward. His extensive patent portfolio and collaborations with esteemed colleagues underscore his contributions to the field of microelectronics. As he continues to develop new inventions, Fuller remains an influential figure in the domain of engineering and technology.

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