Tokyo, Japan

Neeti Vohra


Average Co-Inventor Count = 5.6

ph-index = 3

Forward Citations = 107(Granted Patents)


Location History:

  • Kawasaki, JP (2010)
  • Tokyo, JP (2010 - 2011)

Company Filing History:


Years Active: 2010-2011

Loading Chart...
3 patents (USPTO):Explore Patents

Title: Neeti Vohra - Innovating Precision in Pattern Inspection

Introduction:

Neeti Vohra is a talented inventor based in Tokyo, Japan, known for his remarkable contributions in the field of pattern inspection apparatus and method. With a strong focus on detail and precision, Vohra has successfully secured three patents in his innovative career.

Latest Patents:

Vohra's latest patents revolve around a pattern inspection apparatus and method that cater to fine patterns found in semiconductor integrated circuits (LSI), liquid crystal panels, and photomasks. This cutting-edge technology allows for the inspection of patterns using advanced imaging techniques and design data analysis, ensuring accuracy and efficiency in the fabrication process.

Career Highlights:

During his career, Neeti Vohra has made significant strides in the industry, with notable stints at Nanogeometry Research Inc. and NGR Limited. His expertise in pattern inspection has garnered recognition for enhancing quality control measures in the production of intricate electronic components.

Collaborations:

Vohra has had the privilege of collaborating with esteemed professionals in the field, including Tadashi Kitamura and Kazufumi Kubota. Together, they have pushed the boundaries of innovation and paved the way for advancements in pattern inspection technology.

Conclusion:

In conclusion, Neeti Vohra stands out as a pioneering inventor in the realm of pattern inspection, with a keen eye for detail and a passion for technological advancement. His patents and collaborations reflect a commitment to excellence and a drive to revolutionize the industry. Vohra's work continues to inspire the next generation of innovators in the ever-evolving landscape of precision engineering.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…