The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2010
Filed:
Feb. 16, 2005
Tadashi Kitamura, Kawasaki, JP;
Kazufumi Kubota, Kawasaki, JP;
Shinichi Nakazawa, Kawasaki, JP;
Neeti Vohra, Kawasaki, JP;
Masahiro Yamamoto, Kawasaki, JP;
Tadashi Kitamura, Kawasaki, JP;
Kazufumi Kubota, Kawasaki, JP;
Shinichi Nakazawa, Kawasaki, JP;
Neeti Vohra, Kawasaki, JP;
Masahiro Yamamoto, Kawasaki, JP;
NanoGeometry Research Inc., Tokyo, JP;
Abstract
A pattern inspection apparatus is used for inspecting a pattern, such as semiconductor integrated circuit (LSI), liquid crystal panel, and a photomask by using an image of the pattern to-be-inspected and design data for fabricating the pattern to-be-inspected. The pattern inspection apparatus includes a reference pattern generation device for generating a reference pattern represented by one or more lines from design data, an image generation device for generating the image of the pattern to-be-inspected, a detecting device for detecting an edge of the image of the pattern to-be-inspected, and an inspection device for inspecting the pattern to-be-inspected by comparing the edge of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.