The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 2010
Filed:
May. 17, 2006
Tadashi Kitamura, Tokyo, JP;
Kazufumi Kubota, Tokyo, JP;
Shinichi Nakazawa, Tokyo, JP;
Neeti Vohra, Tokyo, JP;
Masahiro Yamamoto, Tokyo, JP;
Toshiaki Hasebe, Tokyo, JP;
Tadashi Kitamura, Tokyo, JP;
Kazufumi Kubota, Tokyo, JP;
Shinichi Nakazawa, Tokyo, JP;
Neeti Vohra, Tokyo, JP;
Masahiro Yamamoto, Tokyo, JP;
Toshiaki Hasebe, Tokyo, JP;
NanoGeometry Research Inc., Tokyo, JP;
Abstract
A fine pattern, such as a semiconductor integrated circuit (LSI), a liquid crystal panel, and a photomask (reticle) for the semiconductor or the liquid crystal panel, which are fabricated based on data for fabricating the fine pattern such as design data is inspected by a pattern inspection apparatus. The pattern inspection apparatus for inspecting a pattern to-be-inspected uses an image of the pattern to-be-inspected and data for fabricating the pattern to-be-inspected. The pattern inspection apparatus includes a reference pattern generation device configured to generate a reference pattern represented by one or more lines from the data, an image generation device configured to generate the image of the pattern to-be-inspected, a detecting device configured to detect an edge of the image of the pattern to-be-inspected, and an inspection device configured to inspect the pattern to-be-inspected by comparing the edge of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.