Tokyo, Japan

Toshiaki Hasebe


Average Co-Inventor Count = 3.7

ph-index = 4

Forward Citations = 89(Granted Patents)


Company Filing History:


Years Active: 2010-2015

Loading Chart...
5 patents (USPTO):Explore Patents

Title: Toshiaki Hasebe: Innovator in Pattern Inspection Technology

Introduction

Toshiaki Hasebe is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of pattern inspection technology, particularly in the semiconductor and liquid crystal panel industries. With a total of 5 patents to his name, Hasebe's work has been instrumental in advancing the precision and efficiency of pattern inspection processes.

Latest Patents

One of Hasebe's latest patents is a pattern inspection apparatus and method. This innovative apparatus is designed for inspecting fine patterns, such as those found in semiconductor integrated circuits (LSIs), liquid crystal panels, and photomasks (reticles). The apparatus utilizes data for fabricating fine patterns, including design data, to ensure accurate inspections. It features a reference pattern generation device that creates a reference pattern represented by one or more lines, which can be either line segments or curves. Additionally, it includes an image generation device that produces an image of the pattern to be inspected, a detecting device that identifies the edge of this image, and an inspection device that compares the edge with the reference pattern for thorough inspection.

Career Highlights

Throughout his career, Toshiaki Hasebe has worked with notable companies, including Ngr Limited and Nanogeometry Research Inc. His experience in these organizations has allowed him to refine his expertise in pattern inspection technology and contribute to various innovative projects.

Collaborations

Hasebe has collaborated with several talented individuals in his field, including Tadashi Kitamura and Kazufumi Kubota. These collaborations have fostered a creative environment that has led to the development of cutting-edge technologies in pattern inspection.

Conclusion

Toshiaki Hasebe's contributions to pattern inspection technology have made a lasting impact on the semiconductor and liquid crystal panel industries. His innovative patents and collaborative efforts continue to drive advancements in this critical field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…