Neal A Makela

Title: The Innovative Contributions of Neal A. Makela

Introduction

Neal A. Makela is a prominent inventor based in Fishkill, NY (US), known for his significant contributions to the field of semiconductor technology. With a total of 4 patents to his name, Makela has made strides in developing advanced materials and methods that enhance the performance of electronic devices.

Latest Patents

One of his latest patents, titled "Contact using multilayer liner," describes a process involving the formation of an opening within a silicon substrate. This process includes a cleaning procedure that contaminates the opening's bottom and walls with oxygen and fluorine particles. The invention features a lower blocking layer that prevents these fluorine particles from affecting other layers, ensuring the integrity of the multilayer structure. Another notable patent, "Tungsten gate and method for forming," outlines a method for creating a tungsten region for a replacement metal gate. This method involves forming a tungsten seed layer on a liner within a trench of a dielectric layer, ultimately leading to the formation of a tungsten region with a single crystallographic orientation.

Career Highlights

Neal A. Makela has established himself as a key figure in the semiconductor industry through his work at GlobalFoundries Inc. His innovative approaches to material science and semiconductor fabrication have contributed to advancements in the field, making him a valuable asset to his company.

Collaborations

Throughout his career, Makela has collaborated with talented individuals such as Donghun Kang and Christopher Carr Parks. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Neal A. Makela's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry, paving the way for future innovations in electronic devices.