The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 02, 2018
Filed:
Jul. 22, 2016
Applicant:
Globalfoundries Inc., Grand Cayman, KY;
Inventors:
Nicolas L. Breil, Beacon, NY (US);
Neal A. Makela, Saratoga Springs, NY (US);
Praneet Adusumilli, Albany, NY (US);
Domingo A. Ferrer, Clifton Park, NY (US);
Assignee:
GLOBALFOUNDRIES INC., Grand Cayman, KY;
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/417 (2006.01); H01L 29/66 (2006.01); H01L 29/04 (2006.01); H01L 29/08 (2006.01); H01L 21/285 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66795 (2013.01); H01L 21/2855 (2013.01); H01L 29/045 (2013.01); H01L 29/0847 (2013.01); H01L 29/41791 (2013.01); H01L 29/785 (2013.01); H01L 2029/7858 (2013.01);
Abstract
During a physical vapor deposition (PVD) process, the ion energy of a depositing species is controlled. By varying the ion energy throughout the process, the degree of conformality of the deposited layer over three-dimensional structures, including the extent to which the deposited layer merges between adjacent structures can be controlled.
Breil, Nicolas. (2018). Multiple step thin film deposition method for high conformality (U.S. Patent No. 9859403). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9859403
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile