Norwalk, CT, United States of America

Naveen Kumar Sankaran

This inventor holds 1 USPTO granted patent. Top assignee: Asml Netherlands B.v.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naveen Kumar Sankaran. Retrieved from https://idiyas.com/inventor/naveen-kumar-sankaran-xc11350u

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Naveen Kumar Sankaran: Inventor in Lithography Inspection

Introduction

Naveen Kumar Sankaran is an inventor based in Norwalk, Connecticut, and is associated with ASML Netherlands B.V. His work includes an invention focused on inspecting components of lithography apparatus.

Latest Patents

Sankaran is named on 1 patent, titled “Systems and Methods for Inspecting a Portion of a Lithography Apparatus.” The invention describes an inspection system with a body designed to be inserted into a lithography apparatus and handled by its tool handler. A sensor on the body captures images of a selected portion, while software supports semi-automated or automated inspection based on those images.

The approach is designed to make inspections faster and more consistent in image quality. It may also allow inspection without opening or disassembling the apparatus, helping limit disruption to its micro-environment and reduce potential contamination.

Career Highlights

Sankaran’s listed patent reflects work on inspection technology for lithography equipment, an area where reliable imaging and careful control of the apparatus environment are important. His company affiliation is ASML Netherlands B.V.

Collaborations

The available information identifies ASML Netherlands B.V. as Sankaran’s company affiliation and names him on the inspection-system patent. It does not specify additional collaborators.

Conclusion

Naveen Kumar Sankaran’s patented inspection system aims to improve the speed and consistency of lithography-apparatus inspections while reducing the need for disassembly and limiting contamination risks.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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