Kawasaki, Japan

Natsumi Okawa

This inventor holds 1 USPTO granted patent and 4 published patent applications. Top assignee: Tokyo Ohka Kogyo Co., Ltd.. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Natsumi Okawa. Retrieved from https://idiyas.com/inventor/natsumi-okawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Natsumi Okawa: Innovator in Ruthenium Wiring Technology

Introduction

Natsumi Okawa is a prominent inventor based in Kawasaki, Japan. She has made significant contributions to the field of materials science, particularly in the manufacturing of ruthenium wiring. With a focus on innovative methods, Okawa has secured her place as a key figure in her industry.

Latest Patents

Natsumi Okawa holds 1 patent for her invention titled "Method for manufacturing ruthenium wiring." This patent describes a process that involves treating a metal surface containing ruthenium with a first chemical solution. This solution includes a compound that can coordinate with a ruthenium atom. Following this treatment, an etching process is performed using a second chemical solution to refine the metal surface.

Career Highlights

Okawa is currently employed at Tokyo Ohka Kogyo Co., Ltd., where she continues to develop her expertise in materials engineering. Her work has been instrumental in advancing the technology surrounding ruthenium wiring, which has applications in various electronic devices.

Collaborations

Throughout her career, Natsumi Okawa has collaborated with notable colleagues, including Yukihisa Wada and Shinya Koga. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Natsumi Okawa's contributions to the field of ruthenium wiring manufacturing highlight her innovative spirit and dedication to advancing technology. Her work not only enhances the capabilities of electronic devices but also sets a foundation for future advancements in materials science.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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