Miyagi, Japan

Natsuki Yabumoto

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Natsuki Yabumoto. Retrieved from https://idiyas.com/inventor/natsuki-yabumoto

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Natsuki Yabumoto: Innovator in Plasma Processing Technology

Introduction

Natsuki Yabumoto is a prominent inventor based in Miyagi, Japan. She has made significant contributions to the field of plasma processing technology. Her innovative work has led to the development of a unique plasma processing method and apparatus.

Latest Patents

Natsuki Yabumoto holds 1 patent for her invention titled "Plasma processing method and plasma processing apparatus." This patent describes a method that involves attaching a silicon-containing material or a nitrogen-containing material to an electrostatic chuck within a processing container. The process includes adsorbing a workpiece onto the electrostatic chuck, processing it with plasma, and subsequently separating the processed workpiece.

Career Highlights

Yabumoto is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. Her work at this organization has allowed her to further her research and development in plasma processing technologies.

Collaborations

Throughout her career, Natsuki has collaborated with notable colleagues, including Junichi Sasaki and Hidetoshi Hanaoka. These collaborations have contributed to her innovative projects and advancements in the field.

Conclusion

Natsuki Yabumoto is a trailblazer in plasma processing technology, with her patent showcasing her expertise and innovative spirit. Her contributions continue to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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